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Quantum Interferometric Lithography: Exploiting Entanglement to Beat the Diffraction Limit

A. Boto
Journal / Anthology

Year: 1999

Classical, interferometric, optical lithography is diffraction-limited to writing features of a size l/4 or greater, where l is the optical wavelength. Using nonclassical photon number states entangled N at a time, we show that one can write features of minimum size l/(4N) in an N-photon absorbing resist. This result surpasses the usual classical diffraction limit by a factor of N. Since the number of features that can be etched on a two-dimensional surface scales inversely quadratically with feature size, this allows one to write a factor of N^2 more elements on a computer chip. A factor of N=2 can easily be achieved with entangled photon pairs generated from optical parametric downconversion.

*Science > Physics > Quantum Physics