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ASECA: A Cellular-Automata Simulation Program for a Silicon Anisotropic Super-Micro-Etching Process in Aqueous KOH

Kazume Nishidate
Organization: Iwate University
Department: Department of Electrical and Electronic Engineering
David Fowler
Organization: University of Nebraska-Lincoln
Richard J. Gaylord
Organization: University of Illinois at Urbana-Champaign
Department: Department of Material Science and Engineering
Journal / Anthology

Computers in Physics
Year: 1998
Volume: 12
Issue: 1
Page range: 88-93

A three-dimensional anisotropic super micro-etching of crystalline silicone in aqueous KOH is simulated on an atomic level using a new three-dimensional cellular-automata calculational method. The etching simulator ASECA is developed using a rule-based functional Mathematica programming style. The complete program codes and a detailed description of the algorithm are presented.

*Science > Chemistry
*Science > Physics > Solid State Physics

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